Marga Rotteveel

 
 

 
 
Marga Rotteveel (1966) studied photography at the Art Academy in Breda, The Netherlands. She first worked a couple of years as a photographer, but developed herself more and more as a curator. She started at PhotoFestival Naarden as one of the curators and the last editions of the festival she was the creative director together with designer Teun van der Heijden. Besides teaching at two Art Acadmies in the Netherlands (bachelor and master degree programs), she started her own freelance photocurator business with the specialty to work with young talented photographers. Her last two curated shows were for the Lishui International Photofestival (China) and the New York Photofestival (USA).